Please use this identifier to cite or link to this item:
doi:10.22028/D291-24546
Title: | Generation of wet-chemical AR-coatings on plastic substrates by use of polymerizable nanoparticles |
Author(s): | Oliveira, Peter William de Krug, Herbert Frantzen, Andreas Mennig, Martin Schmidt, Helmut K. |
Language: | English |
Year of Publication: | 1997 |
OPUS Source: | Sol-gel optics IV : 30 July-1 August 1997, San Diego, California / Bruce S. Dunn ... [et al.], chairs/editors. - Bellingham, Wash. : SPIE, c1997. - (SPIE proceedings series ; 3136), S. 452-461 |
SWD key words: | Matrix <Chemie> Kolloidchemie Additionsreaktion Polymerisation Nanopartikel Kratzfestigkeit Hydrolyse Kondensation |
DDC notations: | 620 Engineering and machine engineering |
Publikation type: | Conference Paper |
Abstract: | Multi-layer interference filters of surface modified SiO2- and TiO2- nanoparticles have been produced on Polycarbonat (PC) and on scratch resistant film. AR-coatings (Anti-Reflex-coatings) were prepared from a dispersion of SiO2 and TiO2 colloidal nanoparticles in a hybrid inorganic organic matrix. The TiO2 particles have been synthesized by addition of HCl and H2O to a solution of titanium tetraisopropanolate in isopropanol. The SiO2 nanoparticles were synthesized by base catalyzed hydrolyses and condensation of tetraethoxysilane (TEOS) mixed with an aqueous solvent. The surface modification of the TiO2 and SiO2 nanoparticles with 3-glycidoxypropyltrimethoxysilane (GPTS) avoids the agglomeration of the nanoparticles and covalent bonds between the matrix and nanoparticles are formed during a photopolymerization step. The nanoparticles were dispersed in a hydrolyzed GPTS matrix and UVI Cygacure 6974 was added as a photoinitiator. The λ/4 (λ = 550 nm) films of TiO2 and SiO2 sols were prepared on PC and on scratch resistant coated PC by spin-coating techniques. The refractive index of the SiO2/TiO2-coatings can be adjusted from 1.47 up to 1.94 depending on the SiO2 or TiO2 concentration. By the combination of index matching and photopolymerization, a low temperature interference filter can be realized for plastic substrates with reflection of 0.5 % at 550 nm. The coatings show excellent adhesion to the substrates in the cross hatch test and promising mechanical properties. |
Link to this record: | urn:nbn:de:bsz:291-scidok-28503 hdl:20.500.11880/24602 http://dx.doi.org/10.22028/D291-24546 |
ISBN: | 0-8194-2558-3 |
Date of registration: | 6-May-2010 |
Faculty: | SE - Sonstige Einrichtungen |
Department: | SE - INM Leibniz-Institut für Neue Materialien |
Collections: | INM SciDok - Der Wissenschaftsserver der Universität des Saarlandes |
Files for this record:
File | Description | Size | Format | |
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sm199721.pdf | 1,23 MB | Adobe PDF | View/Open |
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