Please use this identifier to cite or link to this item:
doi:10.22028/D291-24110
Title: | Determinação do perfil de tensão em filmes finos por microelipsometria |
Other Titles: | Stress profile determination of thin films by microellipsometry |
Author(s): | De Albuquerque Barros Filho, D. Aegerter, Michel A. |
Language: | (Other) |
Year of Publication: | 1993 |
OPUS Source: | Anais / 37° Congresso Brasileiro de Cerâmica : Curitiba ; 22 a 25 de majo de 1993 / Associação Brasileira de Cerâmica. - Vol. 2. - São Paulo, SP : Associação Brasileira de Cerâmica, 1993, S. 860-867 |
SWD key words: | Dünne Schicht Photoelastischer Modulator Kalibrieren <Messtechnik> |
DDC notations: | 500 Science |
Publikation type: | Conference Paper |
Abstract: | - An optical system was developed to determine the stress profile of transparent thin films by measuring the phase difference between two electromagnetic waves produced by a photoelastic modulator. The system analysis is done by the Mueller matrix of each of its optical components. The calibration and stability of the system are also analyzed. The equipment measures retardation in the range of 1-1500 Å with a spatial resolution of 30 µm. |
Link to this record: | urn:nbn:de:bsz:291-scidok-23344 hdl:20.500.11880/24166 http://dx.doi.org/10.22028/D291-24110 |
Date of registration: | 22-Jul-2009 |
Faculty: | SE - Sonstige Einrichtungen |
Department: | SE - INM Leibniz-Institut für Neue Materialien |
Collections: | INM SciDok - Der Wissenschaftsserver der Universität des Saarlandes |
Files for this record:
File | Description | Size | Format | |
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AEG190.pdf | 3,65 MB | Adobe PDF | View/Open |
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